SCIL Nanoimprint Solutions

SCIL Nanoimprint Solutions

Nanotechnologisch onderzoek

Eindhoven, North Brabant 1.418 volgers

Over ons

SCIL Nanoimprint Solutions offers solutions for patterning nano-structures on large wafers by using its unique and proprietary lithography technology (SCIL). SCIL or Substrate Conformal Imprint Lithography is a cost effective, robust, high yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high quality imprints on wafer areas up to 300 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment down to 1 µm. We help customers with optimized equipment, consumable materials and processes for high volume production. Our solutions enable manufacturers of optics and photonic products to increase performance, lower end-product costs and increase functionality.

Website
www.scil-nano.com
Branche
Nanotechnologisch onderzoek
Bedrijfsgrootte
11 - 50 medewerkers
Hoofdkantoor
Eindhoven, North Brabant
Type
Particuliere onderneming
Opgericht
2016
Specialismen
Nanoimprinting, Nanophotonics en Substrate Conformal Imprint Lithography

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