Don't miss 𝗧𝗵𝗲 𝗠𝗶𝗰𝗿𝗼-𝗢𝗽𝘁𝗶𝗰𝘀 𝗦𝘂𝗺𝗺𝗶𝘁 & 𝗘𝘅𝗽𝗼 taking place next week in Amsterdam! Make sure to attend Marc Verschuuren's talk ‘𝘏𝘪𝘨𝘩-𝑝𝘳𝘦𝘤𝘪𝘴𝘪𝘰𝘯 𝘯𝘢𝘯𝘰𝘪𝘮𝑝𝘳𝘪𝘯𝘵 𝘭𝘪𝘵𝘩𝘰𝘨𝘳𝘢𝑝𝘩𝘺 𝘧𝘰𝘳 𝘴𝘤𝘢𝘭𝘢𝘣𝘭𝘦 𝘈𝘙 𝘸𝘢𝘷𝘦𝘨𝘶𝘪𝘥𝘦 𝑝𝘳𝘰𝘥𝘶𝘤𝘵𝘪𝘰𝘯’. He will show you the potential of SCIL technology and how the precision and reproducibility of our process drive your devices to the next step. Marc and Gert-Jan Hurxkens will be in the # booth. Don't miss the chance to say hi to them and share your concerns. See you there and taste our SCIL stroopwafels! 🔗 https://lnkd.in/dVKKyMvs Organizer: PHABULOuS Pilot Line #SCILnano #Nanoimprint #solutions #AugmentedReality #waveguides #production #photonics #PHABULOuS
SCIL Nanoimprint Solutions’ Post
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In this use case, the Mecademic Meca500 6-axis robot is used in the first-ever lab-based Tensor Tomography Solution. Using X-ray scattering tensor tomography, the FiberScanner3D™ maps microscale fibers in freeform injection-molded fiber-reinforced composites. #Mecademic #Robotics #XRay #Tomography #Meca500
Exciting news! Our Meca500 robot arm is being used in Xnovo Technology new FiberScanner3DTM for flexible 3D sample manipulation in fiber-reinforced composites analysis. This innovative product combines Xnovo's patented grating technology with the precision of our robot to map the fibrous microstructure of large and complex components. FiberScanner3D is a lab-based 3D imaging tool that allows researchers to create high-fidelity maps of a material's fiber orientation, volume fraction, and alignment. It has wide applications in engineering and materials science for predictive design. This powerful technology is a result of a collaboration between Xnovo Technology, Exciscope and the PSI Paul Scherrer Institut Learn more: https://hubs.la/Q02nYNN-0 #XRay #3DSampleManipulation #FiberScanner #Optics
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Innovation beyond borders: Our global impact in Nanoimprint Lithography (NIL) >>> At Stensborg, we’re proud to have built a global network of partners, clients, and distributors who trust us for advanced UV-NIL solutions tailored to their unique needs. Whether it’s university labs pioneering nanofabrication research or high-volume manufacturers scaling up photonics productions, our advanced Roll-to-Roll (R2R) and Roll-to-Plate (R2P) systems are helping innovators save time, reduce costs, and push the boundaries of what's possible. With our customisable machinery, high-quality replication chemistry, and extensive industry experience, we don’t just deliver solutions—we foster strong, collaborative partnerships that amplify your success. 📩 Join the global NIL revolution with Stensborg! Discuss your process requirements with our specialists: https://buff.ly/40yOt0L #Partnerships #GlobalInnovation #NanoimprintLithography #AdvancedManufacturing #RollToRoll #RollToPlate #Nanofabrication #FunctionalSurfaces #Nanostructures
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CEO, Bayflex Solutions (Product lifecycle systems with AI/ML) Smarter & Faster Reliability Verfication & Compliance
We'd rather Do than Talk. Final post from #lopec2024. We received a lot of inquiries following our OE-A (Organic and Printed Electronics Association) demos on the impact of Artificial intelligence in flexible electronics reliability. We will continue to develop these concepts, perhaps with a few leading organizations, but it will take time with technical, ethical, security, business and other AI related questions which have yet to be fully known. Bottom line, we believe that testing by machines will become quite normal especially for testing en masse, but the final preparation of compounds/ components/ devices will always be guided by humans but will be more productive. #aitesting #printedelectronics #bayflexsolutions
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Save the date for our upcoming user forum on August 21 for all our present and future users of our nano fabrication and characterization facilities. #NanoTech #KnowledgeSharing #ResearchCommunity #UserForum
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What is Numerical Aperture (NA), and why is it a game-changer in (High-NA) EUV lithography? : https://lnkd.in/euNTf-BT Posted by Dr. Dr. Tim Rammler for TRUMPF Numerical Aperture (NA) is a fundamental parameter in optical systems, and in semiconductor manufacturing, it’s key to driving innovation. But what exactly does it mean, and how does it impact EUV lithography? NA is a defining parameter in lithography that determines how far we can advance in semiconductor manufacturing. High-NA EUV lithography is setting the stage for a new era in miniaturization, balancing technical benefits with economic potential as it reshapes the future of technology. #semiconductor #manufacturing #technology #innovation #chips #semiconductormanufacturing #advancedtechnology #engineering #lithography #nanometer #research #development #AI #mobileprocessors #EUV #DUV
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New to Nanoimprint Lithography (NIL) or seeking to optimise your development? Here is everything you need to know about rolling NIL >>> Regardless of your experience level, selecting the right nano replication method can be daunting… Different projects have specific requirements, and our specialists are here to support your unique vision. With 20+ years of experience collaborating with worldwide partners, we offer high-quality, advanced nanoimprinting solutions tailored to your needs. DON'T RISK MAKING THE WRONG CHOICE — whether you're an optical device developer, semiconductor manufacturer, or university researcher, dive into the challenges and benefits of each nanoimprint lithography method in today’s slideshow. Contact our team for a personalised assistance: https://lnkd.in/dz3pXtgy #NanoImprintLithography #UVNIL #Nanostructure #Components #RollToRoll #RollToPlate #NanoReplication #OpticalDevices #FunctionalSurfaces
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#xray #spotsize #measurement #imaging And if you want to know even more, have a look at the info provided in the comments.
🔑 Unlocking the power of precision: Why X-ray spot size matters for unrivaled resolution in advanced packaging failure analysis! In X-ray imaging the X-ray spot size is essential for the resolution. With a smaller X-ray spot size, we can achieve higher resolution images, enabling us to detect defects and features at a level of detail that was once unimaginable. At Excillum we continuously push the boundaries of X-ray source technologies. 🔍 Are you ready to see the world with unprecedented clarity? Check out our latest article and connect with us today and be part of the X-ray resolution revolution. #XraySpotSize #PrecisionImaging #Innovation #NanoTube #Failureanalysis #advancedpackaging #Semiconductor #Xrays
X-ray spot size for unrivaled resolution in advanced packaging failure analysis
https://www.excillum.com
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🌟 Revolutionizing Chip Manufacturing with High NA EUV Lithography 🌟 At ASML, they are pushing the boundaries of what’s possible in semiconductor manufacturing. ASML has High NA EUV lithography machines which are a testament to innovation. Imagine this: molten tin is forced through a nozzle to create droplets just 1/3 the width of a human hair. Each droplet is then hit by two laser pulses – one to flatten it like a pancake, and a second to vaporize it into plasma nearly 40 times hotter than the surface of the sun. And this incredible process happens 50,000 times per second! Why do this? To print the tiniest chip patterns at the speed of high-volume manufacturing, ensuring that technology keeps advancing. ASML is powering the future of technology. 🚀 #ASML #EUV #HighNA #Innovation #Semiconductors #downtown #TechnologyForward #live #work #play
It takes extreme engineering to generate extreme ultraviolet light.💥 In our High NA EUV lithography machines, molten tin gets forced through a thin nozzle to create droplets just 1/3 the width of a human hair. Then each of those droplets gets hit by two laser beam pulses – one to flatten it like a pancake, and a second to vaporize it into a plasma that’s nearly 40 times hotter than the surface of the sun. And all that happens 50,000 times per second. Why? So we can print the tiniest chip patterns at the speed of high-volume manufacturing to keep powering technology forward with you.
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This is also the area of deployment of TRUMPF CO2 laser sources….TRUMPF EUV
It takes extreme engineering to generate extreme ultraviolet light.💥 In our High NA EUV lithography machines, molten tin gets forced through a thin nozzle to create droplets just 1/3 the width of a human hair. Then each of those droplets gets hit by two laser beam pulses – one to flatten it like a pancake, and a second to vaporize it into a plasma that’s nearly 40 times hotter than the surface of the sun. And all that happens 50,000 times per second. Why? So we can print the tiniest chip patterns at the speed of high-volume manufacturing to keep powering technology forward with you.
