RAITH Group’s Post

#EBL Alignment/Overlay: In the paper "Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved #electron beam #lithography overlay" by Pohang University of Science and Technology (#POSTECH), authors Gwanho Yoon, Inki Kim, Sunae So, Jungho Mun, Minkyung Kim and Junsuk Rho suggest a simple strategy to minimize electron beam lithography (#EBL) overlay alignment errors by leveraging their specialized alignment marks and calibrators. Discovering that the mechanical errors are uniform in a particular sample, they used the same alignment marks on successive alignment steps to compensate for said errors. This means that for the first EBL step, they calculated the systematic errors and compensated for the same mechanical errors in successive exposures, virtually removing the errors between the first and second patterning layers. The authors claimed their method achieves high reproducibility with sub-20 nm alignment errors on their STS-Elionix ELS-7800. Read more: https://lnkd.in/e6-9jZq7 Register for MAEBL 2024: https://www.maebl.org #nano #nanotechnology #nanofabrication #chips #chipsact #ebeam #litho #workforcedevelopment #semicon #semiconductor #semiconductors #lithography Brian Reynolds, Gary Brake

In the paper "Potential of E-beam lithography for micro- and nano-optics fabrication on large areas," authors Uwe Zeitner (Fraunhofer IIS), Michael Banasch (Hochschule München University of Applied Sciences), Marcus Trost (Vistec Electron Beam GmbH) discuss the technical features, advantages, and limitations of #electron variable shaped beam #lithography and character projection. They show how the technology can favorably be combined to realize #optical #nano-structures for applications, which are as diverse as #gratings for ultra-short laser pulses or high-resolution #spectrometers, computer generated holograms for asphere testing, various optical meta-structures (lenses and gratings), or UV-polarizers. Read more: https://lnkd.in/eQERNvbC

New paper about a new fabrication method for flat magnetic nanostructures out! The study, with first author Christina Vantaraki, uses a 4-step process to create magnetic patterns, using among others our infrastructure: ✅ Sample fabrication by sputtering                             ✅ Creation of patterned mask by electron-beam lithography @Myfab           ✅ Implantation of iron ions through mask @Tandem Lab ✅ Chemical removal of mask                                          🧲 Flat magnetic nanostructures 🧲 Read a popular science summary here 👇

We recently published our work on "Overlapping top gate electrodes based on low temperature atomic layer deposition for nanoscale ambipolar lateral junctions" with Christopher Fuchs, Lena Fürst, Hartmut Buhmann, and Laurens W. Molenkamp. In this paper, we present a method for the formation of gate-defined lateral junctions in semiconducting layers using overlapping top gate electrodes. The microfabrication of the overlapping top gates is based on optical lithography and multiple layers of low-temperature atomic layer deposition. A hafnium oxide layer serves as both gate dielectric and robust insulating layer between two overlapping gate electrodes. Employing standard optical lithography, we achieve a gate separation of approx. 14.5 nm and a large dielectric breakdown field. The full text of our paper can be found here: https://lnkd.in/ekKHFy3a #atomiclayerdeposition #lithography #microfabrication #2Dtransport #quantumhalleffect #HgTe #topologicalinsulators

Just returned from SPIE Photonics Europe including two days of intensive discussions and networking with the LIMES cluster, in which we are participating with our Horizon Europe project OPTIMAL (https://lnkd.in/dsfp2_VE). 💪 OPTIMAL - this is the next level of multiphoton laser lithography for ultrafast fabrication of 270 x 630 mm masters/tools with versatile micro- and nanostructures is 💪 #mastering #laserlithography #lasermicromachining #3dmetalprinting

In the paper "Fabrication of plasmonic Au nanostructures on dielectric supports using 10 keV electron beam lithography and tests for SERS biodetection," University of Alberta authors Haseeb Ahmed, Min Wu, Maria Stepanova optimized a 10 keV EBL process to fabricate periodic arrays of 50 nm pitch dots on fused silica (FS) supports. They then used the patterned PMMA as a mask to fabricate 50 nm pitch arrays of Au dots on FS using conductive coating Electra 92 from Allresist GmbH (a MAEBL charter sponsor) to prevent surface charging. The gold dots were then biofunctionalized with thiolated DNA aptamers, opening pathways for numerous applications from ultrasensitive surface-enhanced Raman scattering (#SERS). Read more: https://lnkd.in/eKGZ5Swc MAEBL is the workshop for new and experienced electron beam lithographers. Our first bonus #MAEBLx meeting is in two weeks on May 1, 2024. Register at https://lnkd.in/gUm4MZbZ #nano #nanotechnology #nanofabrication #chips #chipsact #ebeam #litho #workforcedevelopment #semicon #semiconductor #semiconductors #lithography

Advancements in Deep Ultraviolet Laser Technology Researchers developed a 60-milliwatt solid-state DUV laser at 193 nm using LBO crystals, setting new benchmarks in efficiency values. In the realm of science and technology, harnessing coherent light sources in the deep ultraviolet (DUV) region holds immense significance across various applications such as lithography, defect inspection, metrology, and spectroscopy. Traditionally, high-power 193-nanometer (nm) lasers have been pivotal in lithography, forming an integral part of systems used for precise patterning. However, the coherence limitations associated with conventional ArF excimer lasers hinder their effectiveness in applications requiring high-resolution patterns, like interference lithography. Continue reading https://lnkd.in/dDU8eMqE

We are pleased to share that three of our research papers have been accepted for presentation at the upcoming "Metrology, Inspection, and Process Control XXXIX" conference, part of the SPIE Advanced Lithography + Patterning 2025 program, to be held in San Jose, California, USA, from February 23–27, 2025. Accepted Papers: 1. "Extreme-Ultraviolet Lithography Line-Space Patterning Defect Detection Using Voltage Contrast SEM" Authors: Mahmudul Hasan, Bappaditya Dey, Victor Blanco, Christophe Beral, Anne-Laure Charley 2. "Towards Robust Defect Inspection in Advanced Node Semiconductors via Continual Learning" Authors: Bappaditya Dey, Amit Prasad, Aya Belgharat, Victor M. Blanco Carballo, Sandip Halder 3. "A ViT-Based Approach for Enhanced Defect Classification in Nano-Ridge Engineering Using Multi-Resolution Images" Authors: Bappaditya Dey, Tom Tandecki, Aya Belgharat, Peter Swekis, Reynald Alcotte, Yves Mols, Bernadette Kunert, Sandip Halder Thanks to all co-authors for their invaluable contributions and discussions. https://lnkd.in/gUEwgwPv

Dr. Joost van Ginkel, an alumnus of Delft University of Technology, has been using our nanoprinting technology to print nanoparticles on silicon wafers and microelectronic devices. In this interview, he discusses the challenges of using complex synthesis procedures and imprecise deposition methods such as drop casting or lithography for coating devices with nanoparticles. Further, he highlights how VSPARTICLE's technology offers simplicity and versatility, with a clean and precise deposition method that allows for quick experiment setup. The ability to print nanoparticle structures on various substrates within an hour opens up new opportunities for rapid material development and exploration of new ideas. Read full article here: https://lnkd.in/dasYr27S #testimonials #nanotechnology #microelectronics #deposition #materialdevelopment

The dose-to-size—the amount of exposure a specific area receives—in electron beam lithography, is crucial for achieving the desired critical dimensions (CD). Overexposure can oversize patterns, where features become larger than intended, while underexposure can result in underdeveloped or missing features. To optimize your results, it's essential to calibrate the dose for your specific resist and substrate combination, considering factors like resist sensitivity, beam energy, substrate material and pattern density. 🌎 Register for MAEBL 2024 to learn how to calibrate your exposure dose in electron beam lithography: https://www.maebl.org #nano #nanotechnology #nanofabrication #chips #chipsact #ebeam #ebl #electron #workforcedevelopment #semicon #semiconductor #semiconductors #lithography #nanolithography #litho Image credit: "On the trends and application of pattern density dependent isofocal dose of positive resists for 100 keV electron beam lithography," https://lnkd.in/emgQ7T3S, Gerald Lopez, Glen de Villafranca, Sam Griggs, Meredith Metzler, Kevin Lister, LaBella Michael, Chad Eichfeld, Nikola Belic, Uli Hofmann